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China’s Domestic Photoresist Successfully Validated! (www.trendforce.com)

submitted 3 weeks ago by yogthos@lemmygrad.ml to c/technology@lemmygrad.ml

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[–] Sodium_nitride@lemmygrad.ml 5 points 3 weeks ago (2 children)

the T150 A demonstrates an extreme resolution of 120nm during the lithography process

This sounds like a very large feature size given the existence of 3-5 nm process nodes. Or am I missing something here?

[–] knfrmity@lemmygrad.ml 7 points 3 weeks ago

The photoresist is a component of photolithography, but doesn't determine the process node on its own. The 120nm quoted here is quite advanced compared to the capitalist products I have found advertised (200nm or so).

Photolithography (also known as optical lithography) is a process used in the manufacturing of integrated circuits. It involves using light to transfer a pattern onto a substrate, typically a silicon wafer.

The process begins with a photosensitive material, called a photoresist, being applied to the substrate. A photomask that contains the desired pattern is then placed over the photoresist. Light is shone through the photomask, exposing the photoresist in certain areas. The exposed areas undergo a chemical change, making them either soluble or insoluble in a developer solution. After development, the pattern is transferred onto the substrate through etching, chemical vapor deposition, or ion implantation processes.

https://en.m.wikipedia.org/wiki/Photolithography

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